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Ordinary Discount Styrene Oxide - (R)-Styrene Oxide CAS 20780-53-4 Chemical Purity ≥96.0% E.E ≥98.0% High Purity – Ruifu Featured Image
  • Ordinary Discount Styrene Oxide - (R)-Styrene Oxide CAS 20780-53-4 Chemical Purity ≥96.0% E.E ≥98.0% High Purity – Ruifu

Ordinary Discount Styrene Oxide - (R)-Styrene Oxide CAS 20780-53-4 Chemical Purity ≥96.0% E.E ≥98.0% High Purity – Ruifu

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Ordinary Discount Styrene Oxide - (R)-Styrene Oxide CAS 20780-53-4 Chemical Purity ≥96.0% E.E ≥98.0% High Purity – Ruifu Detail:

Manufacturer Supply with High Purity and Stable Quality
Chemical Name: (R)-Styrene Oxide
CAS: 20780-53-4 
Chiral Compounds, High Quality, Commercial Production

Chemical Name (R)-Styrene Oxide
Synonyms (R)-Phenylethylene Oxide; (R)-Phenyloxirane
CAS Number 20780-53-4
CAT Number RF-CC231
Stock Status In Stock, Production Scale Up to Tons
Molecular Formula C8H8O
Molecular Weight 120.15
Density 1.051 g/mL at 25℃ (lit.)
Refractive Index n20/D 1.535
Brand Ruifu Chemical
Item Specifications
Appearance Pale Yellow to Colorless Liquid
Chemical Purity ≥96.0%
Optical Purity E.E ≥98.0% 
Moisture (K.F) ≤0.50%
Test Standard Enterprise Standard
Usage Chiral Compounds; Pharmaceutical Intermediates

Package: Bottle, Barrel, 25kg/Barrel, or according to customer’s requirement.

Storage Condition: Store in sealed containers at cool and dry place; Protect from light, moisture and pest infestation.

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Shanghai Ruifu Chemical Co., Ltd. is the leading manufacturer and supplier of (R)-Styrene Oxide (CAS: 20780-53-4) with high quality, widely used in organic synthesis, synthesis of pharmaceutical intermediates and fine chemical synthesis.

Shanghai Ruifu Chemical Co., Ltd. plays an important role in the chiral chemistry, the company is committed to the production of chiral compounds. Our products are widely praised by customers.

(R)-Styrene Oxide (CAS: 20780-53-4) is a reagent used to produce a homologated epoxide as part of a synthetic approach to (+)-allosedamine. It is the main metabolite of styrene, catalyzed by epoxide hydrolase.

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